Ref HAL: hal-03037520_v1
DOI: 10.1063/1.3680564
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Résumé:

We demonstrate that the carrier concentration of epitaxial graphene devices grown on the C-face of a SiC substrate is efficiently modulated by a buried gate. The gate is fabricated via the implantation of nitrogen atoms in the SiC crystal. The charge neutrality point is observed close to gate voltage zero, and graphene can be populated by either holes or electrons down to low temperature (1.5 K). The hole concentration is hardly tuned by the gate voltage, possibly because of interface states below the Dirac point. A remarkably large quantum Hall plateau is observed for electrons. (C) 2012 American Institute of Physics. [doi:10.1063/1.3680564]