In Recognition of Professor Hitchman: Advances in Chemical Vapor Deposition Auteur(s): Maury Francis, Alexandrov S., Barreca Davide, Davazoglou Dimitris, Pemble Martyn (Article) Publié: Advanced Materials Interfaces, vol. 4 p.1700984 (2017) Texte intégral en Openaccess : Ref HAL: hal-03929817_v1 DOI: 10.1002/ADMI.201700984 Exporter : BibTex | endNote Résumé: Chemical vapor deposition (CVD) processes had been around for nearly 100 years before they began to attract interest from materials scientists and electronics engineers in the 60s and 70s, as a result of the rapidly growing microelectronics industry. The successful development of this complicated technology required a deep physicochemical understanding of deposition processes and reaction mechanisms. This resulted in a large number of scientists from different disciplines studying the basics of CVD... |