Auteur(s): Orosz Laurent, Réveret François, Bouchoule Sophie, Zúñiga-Pérez Jesús, Médard François, Leymarie Joël, Disseix Pierre, Mihailovic Martine, Frayssinet Eric, Semond Fabrice, Leroux Mathieu, Mexis M., Brimont C., Guillet T.
(Article) Publié:
-Japanese Journal Of Applied Physics, Part 2 Letters, vol. 4 p.072001 (2011)
Texte intégral en Openaccess : 
Ref HAL: hal-00632924_v1
Ref Arxiv: 1105.0747
DOI: 10.1143/APEX.4.072001
WoS: 000292876400005
Ref. & Cit.: NASA ADS
Exporter : BibTex | endNote
11 Citations
Résumé:
In order to achieve polariton lasing at room temperature, a new fabrication methodology for planar microcavities is proposed: a ZnO-based microcavity in which the active region is epitaxially grown on an AlGaN/AlN/Si substrate and in which two dielectric mirrors are used. This approach allows us to simultaneously obtain a high-quality active layer together with a high photonic confinement as demonstrated through macro-, micro-photoluminescence (µ-PL) and reflectivity experiments. A quality factor of 675 and a maximum PL emission at k ~ 0 are evidenced thanks to µ-PL, revealing an efficient polaritonic relaxation even at low excitation power.