Probing the Ultimate Plasmon Confinement Limits with a Van der Waals heterostructure Auteur(s): Iranzo David alcaraz, Nanot S., Dias Eduardo j. c., Epstein Itai, Peng Cheng, Efetov Dmitri k., Lundeberg Mark b., Parret R., Osmond Johann, Hong Jin-yong, Kong Jing, Englund Dirk r., Peres Nuno m. r., Koppens Frank h. l. (Article) Publié: Science, vol. 360 p.291-295 (2018) Texte intégral en Openaccess : Ref HAL: hal-01772009_v1 Ref Arxiv: 1804.01061 DOI: 10.1126/science.aar8438 WoS: 000430396600037 Ref. & Cit.: NASA ADS Exporter : BibTex | endNote 103 Citations Résumé: The ability to confine light into tiny spatial dimensions is important for applications such as microscopy, sensing and nanoscale lasers. While plasmons offer an appealing avenue to confine light, Landau damping in metals imposes a trade-off between optical field confinement and losses. We show that a graphene-insulator-metal heterostructure can overcome that trade-off, and demonstrate plasmon confinement down to the ultimate limit of the lengthscale of one atom. This is achieved by far-field excitation of plasmon modes squeezed into an atomically thin hexagonal boron nitride dielectric h-BN spacer between graphene and metal rods. A theoretical model which takes into account the non-local optical response of both graphene and metal is used to describe the results. These ultra-confined plasmonic modes, addressed with far-field light excitation, enables a route to new regimes of ultra-strong light-matter interactions. Commentaires: 17 pages, 4 figures |