High temperature annealing and CVD growth of few-layer graphene on bulk AlN and AlN templates Auteur(s): Dagher R., Matta S., Parret R., Paillet M., Jouault B., Nguyen L., Portail M., Zielinski M., Chassagne T., Tanaka S., Brault J., Cordier Y., Michon A. (Article) Publié: Physica Status Solidi A, vol. 214 p.1600436 (2017) Ref HAL: hal-01563258_v1 DOI: 10.1002/pssa.201600436 WoS: WOS:000402158300006 Exporter : BibTex | endNote 6 Citations Résumé: Graphene and AlN are promising materials, interesting to combine together. In this study, we will present first results for direct growth of graphene on bulk AlN and on AlN templates using chemical vapor deposition, including the annealing of these substrates at high temperatures. Atomic force microscopy (AFM) enabled us to study the evolution of the AlN surface morphology after annealing and growth. Few-layer graphene deposition is demonstrated on the basis of X-ray photoemission and Raman spectroscopy |