Auteur(s): Rousseau E., Laroche Marine, Greffet Jean-Jacques
(Article) Publié:
Applied Physics Letters, vol. 95 p.231913 (2009)
Texte intégral en Openaccess : 
Ref HAL: hal-00428587_v1
DOI: 10.1063/1.3271681
WoS: 000272627700028
Exporter : BibTex | endNote
30 Citations
Résumé:
In this letter, we revisit the role of surface plasmons for nanoscale radiative heat transfer between doped silicon surfaces. We derive a new accurate and closed-form expression of the radiative near-field heat transfer. We also analyse the flux and find that there is a doping level that maximizes the heat flux.